3198 patents
Page 28 of 160
Utility
P-type dipole for p-FET
23 May 23
Methods of forming and processing semiconductor devices are described.
Yongjing Lin, Karla M Bernal Ramos, Shih Chung Chen, Yixiong Yang, Lin Dong, Steven C. H. Hung, Srinivas Gandikota
Filed: 10 Feb 22
Utility
Method of making high resolution OLED fabricated with overlapped masks
23 May 23
Embodiments of the present disclosure relate to an apparatus and methods for forming arrays of EL devices and forming the EL devices with overlapped mask plates.
Chung-Chia Chen, Byung-Sung Kwak, Robert Jan Visser
Filed: 6 Jan 21
Utility
rkn djycil5vspry0z3h9tu6ybzowgfdh5lo0dsn4h6afuic3x3n1fz8r
16 May 23
Embodiments of the present invention provide a polishing ring assembly suitable for polishing an electrostatic chuck and method of using the same.
William Ming-ye Lu, Wendell Glenn Boyd, Jr., Stacy Meyer
Filed: 2 Dec 21
Utility
jsira8z1eec js1gh9tsazc57t
16 May 23
A method of cleaning a conditioner head includes bringing two clamps of a cleaning tool inward toward a disk-shaped pad conditioner head to press a sponge against an outer surface of the disk-shaped pad conditioner head, and creating relative motion between the cleaning tool and the pad conditioner head to wipe the sponge against the pad conditioner head.
Shantanu Rajiv Gadgil, Sumit Subhash Patankar, Nathan Arron Davis, Michael J. Coughlin, Allen L. D'Ambra
Filed: 24 Jun 22
Utility
bxs01y ulg18spdf10rg
16 May 23
Implementations of the present disclosure generally relate to the fabrication of integrated circuits.
Xinyu Bao, Chun Yan, Hua Chung, Schubert S. Chu
Filed: 4 Feb 19
Utility
xw1urjsab744oor11b7hlhatjqm9tmwuwiwjsqa
16 May 23
Embodiments generally relate to methods for depositing silicon-phosphorous materials, and more specifically, relate to using silicon-phosphorous compounds in vapor deposition processes (e.g., epitaxy, CVD, or ALD) to deposit silicon-phosphorous materials.
Errol Antonio C Sanchez, Mark J. Saly, Schubert Chu, Abhishek Dube, Srividya Natarajan
Filed: 2 Aug 19
Utility
stxrea7gpth37mlkmcszqfn c4
16 May 23
Methods and apparatuses for minimizing line edge/width roughness in lines formed by photolithography are provided.
Huixiong Dai, Mangesh Bangar, Christopher S. Ngai, Srinivas D. Nemani, Ellie Y. Yieh, Steven Hiloong Welch
Filed: 11 Oct 19
Utility
kpxx9dnayihbdyr7zc7pyqm0aiwncp
16 May 23
A method of generating training spectra for training of a neural network includes measuring a first plurality of training spectra from one or more sample substrates, measuring a characterizing value for each training spectra of the plurality of training spectra to generate a plurality of characterizing values with each training spectrum having an associated characterizing value, measuring a plurality of dummy spectra during processing of one or more dummy substrates, and generating a second plurality of training spectra by combining the first plurality of training spectra and the plurality of dummy spectra, there being a greater number of spectra in the second plurality of training spectra than in the first plurality of training spectra.
Benjamin Cherian, Nicholas Wiswell, Jun Qian, Thomas H. Osterheld
Filed: 21 Jun 19
Utility
hh8c5oyny33ss82wy04esvs57kslvd8
16 May 23
A method for process control of a semiconductor structure fabricated by a series of fabrication steps, the method comprising obtaining an image of the semiconductor structure indicative of at least two individual fabrication steps; wherein the image is generated by scanning the semiconductor structure with a charged particle beam and collecting signals emanating from the semiconductor structure; and processing, by a hardware processor, the image to determining a parameter of the semiconductor structure, wherein processing includes measuring step/s from among the fabrication steps as an individual feature.
Roman Kris, Roi Meir, Sahar Levin, Ishai Schwarzband, Grigory Klebanov, Shimon Levi, Efrat Noifeld, Hiroshi Miroku, Taku Yoshizawa, Kasturi Saha, Sharon Duvdevani-Bar, Vadim Vereschagin
Filed: 31 Oct 19
Utility
v94l66zdwasyf35hk8vlebj4pliwq
16 May 23
An ion source capable of extracting a ribbon ion beam with improved vertical angular uniformity is disclosed.
Alexandre Likhanskii, Jay T. Scheuer, Sudhakar Mahalingam, Nevin Clay
Filed: 26 Oct 21
Utility
81g1s697z1tcv32320mrszc9h2y
16 May 23
Methods and apparatus for processing a substrate are provided herein.
Kartik Ramaswamy, Yang Yang, Kenneth Collins, Steven Lane, Gonzalo Monroy, Yue Guo
Filed: 2 Jun 21
Utility
kzz7neg814gueg6rznkpdsymmdcq1m0ccjo9w9nm8ov
16 May 23
An insulating system to reduce or eliminate the possibility of arcing while the pressure within a chamber is being varied is disclosed.
Jonathan D. Fischer, Steven M. Anella, Manohara Kumar
Filed: 27 Jan 21
Utility
5aufpjstqi3lue6lh99gu1 max21ge25rim5vk6a0gzuelfc9k
16 May 23
A substrate support pedestal comprises an electrostatic chuck, a cooling base, a gas flow passage, a porous plug, and a sealing member.
Stephen Donald Prouty, Andreas Schmid, Jonathan Simmons, Sumanth Banda
Filed: 15 Feb 22
Utility
8i3rixwgsg5q1xguxoytfofzoge6i3 1rn8nmmb8agd0jum7s0f6jp
16 May 23
A superconducting nanowire single photon detector (SNSPD) device includes a substrate having a top surface, an optical waveguide on the top surface of the substrate to receive light propagating substantially parallel to the top surface of the substrate, a seed layer of metal nitride on the optical waveguide, and a superconductive wire on the seed layer.
Zihao Yang, Mingwei Zhu, Nag B. Patibandla, Nir Yahav, Robert Jan Visser, Adi de la Zerda
Filed: 29 Jan 21
Utility
0p63hmbt6u8v0a qxno0u
9 May 23
A method of fabricating a polishing pad using an additive manufacturing system includes depositing a first set successive layers by droplet ejection to form a.
Daniel Redfield, Jason Garcheung Fung, Mayu Felicia Yamamura
Filed: 29 Dec 20
Utility
1d81tomcup59np3sjjbi4wbiljpf
9 May 23
Processing methods for forming iridium-containing films at low temperatures are described.
Feng Q. Liu, Hua Chung, Schubert Chu, Mei Chang, Jeffrey W. Anthis, David Thompson
Filed: 12 Sep 18
Utility
16b6gp72g3m dytpzhsox2c0waxzzt
9 May 23
Exemplary semiconductor processing chambers may include a substrate support including a top surface.
Nitin Pathak, Tuan A. Nguyen, Amit Bansal, Badri N. Ramamurthi, Thomas Rubio, Juan Carlos Rocha-Alvarez
Filed: 26 Mar 21
Utility
ka6nkuzraduae55uydi5khg
9 May 23
Disclosed herein is a computer-implemented method for generating calibration data usable for analysis of a sample.
Yariv Simovitch
Filed: 11 Aug 20
Utility
b4y90syqaa4ao1kmj 56zpm0cslfpmc7pydmr5yvnv055u35s54nnp
9 May 23
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed.
Shuwei Liu, Vibhu Jindal
Filed: 13 Apr 21
Utility
tcsnjhih4uomq0nvncl19zf0aav9dphlz5i4cyii4xar0ok1x2
9 May 23
Embodiments of baking chambers for baking a photomask are provided herein.
Banqiu Wu, Khalid Makhamreh, Eliyahu Shlomo Dagan
Filed: 9 Apr 21