7578 patents
Page 24 of 379
Utility
Adjustable Achromatic Collimator Assembly for Endpoint Detection Systems
26 Oct 23
Implementations disclosed describe a collimator assembly having a collimator housing that includes an interface configured to optically couple to a process chamber that has a target surface, and a port to receive an optical fiber to deliver, to an enclosure formed by the collimator housing, a first (second) plurality of spectral components of light belonging to a first (second) range of wavelengths, and an achromatic lens located, at least partially, within the enclosure formed by the collimator housing, the achromatic lens to direct the first (second) plurality of spectral components of light onto the target surface to illuminate a first (second) region on the target surface, wherein the second region is substantially the same as the first region.
Pengyu Han, John John O’Malley, Michael N. Grimbergen, Lei Lian, Upendra Ummethala, Michael Kutney
Filed: 27 Jun 23
Utility
Methods of Greytone Imprint Lithography to Fabricate Optical Devices
26 Oct 23
A method of imprinting a pattern on a substrate is provided.
Hao TANG, Kang LUO, Erica CHEN, Yongan XU
Filed: 12 Jun 23
Utility
Methods and Mechanisms for Generating Virtual Knobs for Model Performance Tuning
26 Oct 23
An electronic device manufacturing system configured to receive, by a processor, input data reflecting a feature related to a manufacturing process of a substrate.
Jui-Che Lin, Yan-Jhu Chen, Chao-Hsien Lee, Shauh-Teh Juang, Pengyu Han, Wallace Wang
Filed: 25 Apr 22
Utility
Paddle chamber with anti-splashing baffles
24 Oct 23
Electroplating systems according to embodiments of the present technology may include a plating chamber configured to deposit metal material onto substrates positioned in the plating chamber.
Nolan L. Zimmerman
Filed: 15 Oct 20
Utility
Method of cooling a deposition source, chamber for cooling a deposition source and deposition system
24 Oct 23
A method (100) of cooling a deposition source (200) is described.
Claire Armstrong, Frank Schnappenberger, Thomas Deppisch
Filed: 16 Nov 17
Utility
Optical inspection using controlled illumination and collection polarization
24 Oct 23
An optical inspection system that may include an illumination optics configured to generate an illumination light beam and to illuminate a sample with the illumination light beam; at least one collection optics configured to collect light from the sample; at least one detector configured to detect at least one detected light beam outputted from the at least one collection optics; multiple polarizers that are configured to (a) set a polarization of the illumination light beam by selectively introducing, under a control of the control unit, at least one illumination optics polarization change, and (b) set a polarization of the at least one detected light beam by selectively introducing, under a control of the control unit, at least one collection optics polarization change.
Elad Eizner, Amir Shoham
Filed: 20 Oct 21
Utility
Electrostatic chuck with porous plug
24 Oct 23
Electrostatic chucks and method for forming the same are described herein.
Arvinder Chadha, Tomoaki Kohzu
Filed: 3 Feb 22
Utility
Printed chemical mechanical polishing pad having particles therein
24 Oct 23
A method of fabricating a polishing layer of a polishing pad includes determining a desired distribution of particles to be embedded within a polymer matrix of the polishing layer.
Kasiraman Krishnan, Nag B. Patibandla, Periya Gopalan
Filed: 19 Jun 18
Utility
Bonding structure of e chuck to aluminum base configuration
24 Oct 23
The present disclosure is a method of bonding an electrostatic chuck to a temperature control base.
Vijay D. Parkhe, Roger Alan Lindley
Filed: 11 Nov 21
Utility
Platen surface modification and high-performance pad conditioning to improve CMP performance
24 Oct 23
Embodiments herein generally relate to chemical mechanical polishing (CMP) systems and methods for reducing non-uniform material removal rate at or near the peripheral edge of a substrate when compared to radially inward regions therefrom.
Christopher Heung-Gyun Lee, Anand Nilakantan Iyer, Hyuen Karen Tran, Ghunbong Cheung
Filed: 28 Sep 20
Utility
Methods for depositing anti-coking protective coatings on aerospace components
24 Oct 23
Embodiments of the present disclosure generally relate to protective coatings on an aerospace component and methods for depositing the protective coatings.
David A. Britz
Filed: 16 Aug 19
Utility
Compensation for slurry composition in in-situ electromagnetic inductive monitoring
24 Oct 23
A method of chemical mechanical polishing includes bringing a conductive layer of a substrate into contact with a polishing pad, supplying a polishing liquid to the polishing pad, generating relative motion between the substrate and the polishing pad, monitoring the substrate with an in-situ electromagnetic induction monitoring system as the conductive layer is polished to generate a sequence of signal values that depend on a thickness of the conductive layer, and determining a sequence of thickness values for the conductive layer based on the sequence of signal values.
Kun Xu, Andrew Siordia
Filed: 15 Dec 20
Utility
Reconstruction of a distorted image of an array of structural elements of a specimen
24 Oct 23
There is provided a method and a system configured to compensate for image distortions.
Yehuda Cohen, Rafael Bistritzer
Filed: 7 Jul 20
Utility
Apparatus and methods for controlling ion energy distribution
24 Oct 23
Embodiments of the present disclosure generally relate to apparatus and methods for controlling an ion energy distribution during plasma processing.
Linying Cui, James Rogers
Filed: 16 Nov 20
Utility
Ultraviolet and ozone clean system
24 Oct 23
A cleaning apparatus for cleaning a substrate includes a lamp for emitting ultraviolet radiation in an irradiation region; a housing that houses the lamp; a water deflector spaced below the housing, the water deflector having a water inlet for receiving a supply of ozonated water and a water outlet for discharging ozonated water irradiated by the lamp into a substrate processing region beneath the water deflector, and defining a water flow path between the water inlet and the water outlet, the water flow path extending in the irradiation region; an upper reflector extending along and above the lamp; and a lower reflector extending along and below the water deflector, wherein the upper reflector and the lower reflector at least partially define the irradiation region and reflect ultraviolet radiation toward the water flow path, and wherein the lower reflector shields the substrate from ultraviolet radiation emitted by the lamp.
Banqiu Wu, Khalid Makhamreh, Hiroki Ogawa, Eliyahu Shlomo Dagan
Filed: 9 Aug 21
Utility
Selective removal of ruthenium-containing materials
24 Oct 23
Exemplary etching methods may include flowing an oxygen-containing precursor into a processing region of a semiconductor processing chamber.
Baiwei Wang, Xiaolin C. Chen, Rohan Puligoru Reddy, Oliver Jan, Zhenjiang Cui, Anchuan Wang
Filed: 26 Apr 21
Utility
Gas delivery systems and methods
24 Oct 23
A system may include a main line for delivering a first gas, and a sensor for measuring a concentration of a precursor in the first gas delivered through the main line.
Diwakar Kedlaya, Fang Ruan, Zubin Huang, Ganesh Balasubramanian, Kaushik Alayavalli, Martin Seamons, Kwangduk Lee, Rajaram Narayanan, Karthik Janakiraman
Filed: 11 Nov 20
Utility
In-situ wafer rotation for carousel processing chambers
24 Oct 23
Apparatus and methods of processing a substrate in a carousel processing chamber are described.
Joseph Yudovsky, Alexander S. Polyak
Filed: 27 Apr 19
Utility
Self-aligned trench MOSFET
24 Oct 23
Methods may include providing a device structure including a well formed in an epitaxial layer, and forming a plurality of shielding layers in the device structure, wherein at least one shielding layer is formed between a pair of adjacent sacrificial gates of a plurality of sacrificial gates.
Qintao Zhang, Samphy Hong, Jason Appell, David J. Lee
Filed: 23 Apr 21
Utility
Additive patterning of semiconductor film stacks
24 Oct 23
One or more embodiments described herein generally relate to patterning semiconductor film stacks.
John O. Dukovic, Srinivas D. Nemani, Ellie Y. Yieh, Praburam Gopalraja, Steven Hiloong Welch, Bhargav S. Citla
Filed: 24 May 21