7578 patents
Page 21 of 379
Utility
System using pixelated faraday sensor
7 Nov 23
A system and method for optimizing a ribbon ion beam in a beam line implantation system is disclosed.
Eric D. Hermanson, Nevin Clay, Antonella Cucchetti, Philip Layne, Sudhakar Mahalingam, Michael Simmons
Filed: 9 Dec 21
Utility
Apparatus and method of ion current compensation
7 Nov 23
Embodiments provided herein generally include apparatus, plasma processing systems and methods for generation of a waveform for plasma processing of a substrate in a processing chamber.
Yang Yang, Yue Guo, Kartik Ramaswamy
Filed: 16 Jun 21
Utility
Reactive particles supply system
7 Nov 23
A reactive particles supply system that may include an adjustable gas supply unit that is arranged to supply gas and to set a gas condition, a reactive particles supply unit that may be arranged to receive the gas, and an adjustable reactive particles output unit that may include a reactive particles input, a second reactive particles output, and a reactive particles path.
Asaf Gutman, Irit Ruach-Nir, Kfir Luria, Sven Ruhle, Guy Eytan
Filed: 21 Dec 20
Utility
Faceplate with edge flow control
7 Nov 23
Exemplary semiconductor processing chambers may include a gasbox.
Fang Ruan, Prashant Kumar Kulshreshtha, Rajaram Narayanan, Diwakar Kedlaya
Filed: 23 Apr 20
Utility
Temperature and bias control of edge ring
7 Nov 23
Embodiments described herein provide methods and apparatus used to control a processing result profile proximate to a circumferential edge of a substrate during the plasma-assisted processing thereof.
James Rogers, Linying Cui, Rajinder Dhindsa
Filed: 18 Jun 21
Utility
Methods and apparatus for controlling ion fraction in physical vapor deposition processes
7 Nov 23
Methods and apparatus for processing substrates are disclosed.
Xiaodong Wang, Joung Joo Lee, Fuhong Zhang, Martin Lee Riker, Keith A. Miller, William Fruchterman, Rongjun Wang, Adolph Miller Allen, Shouyin Zhang, Xianmin Tang
Filed: 30 Sep 21
Utility
Contour pocket and hybrid susceptor for wafer uniformity
7 Nov 23
Susceptor assemblies comprising a susceptor base and a plurality of pie-shaped skins thereon are described.
Kaushal Gangakhedkar, Kallol Bera, Joseph Yudovsky
Filed: 12 Dec 22
Utility
Methods for forming light emitting diodes
7 Nov 23
Methods for forming light emitting diodes (LEDs) that leverage cavity profiles and induced stresses to alter emitted wavelengths of the LEDs.
Taichou Papo Chen
Filed: 30 Dec 20
Utility
Prevention of contamination of substrates during gas purging
7 Nov 23
Disclosed are implementations for efficient purging of substrate carriers (and content held therein) and preventing external contaminants from entering a gas purge apparatus by coupling the gas purge apparatus to a substrate carrier, performing a first gas purging session of an environment of the substrate carrier, receiving a first signal of a first signal type, responsive to receiving the first signal, keeping the gas purge apparatus coupled to the substrate carrier, performing a second gas purging session of the environment of the substrate carrier, receiving a second signal of a second signal type, and, responsive to receiving the second signal, decoupling the purge apparatus from the substrate carrier.
Douglas Brian Baumgarten, Russell Kaplan, Amitabh Puri, Paul B. Reuter
Filed: 9 Jul 20
Utility
Resonator, linear accelerator configuration and ion implantation system having rotating exciter
7 Nov 23
An exciter for a high frequency resonator.
Costel Biloiu, David T. Blahnik, Wai-Ming Tam, Charles T. Carlson, Frank Sinclair
Filed: 20 Oct 21
Utility
Chamber injector
7 Nov 23
Embodiments described herein generally relate to apparatus for fabricating semiconductor devices.
Shu-Kwan Lau, Lit Ping Lam, Preetham Rao, Kartik Shah, Ian Ong, Nyi O. Myo, Brian H. Burrows
Filed: 6 Oct 22
Utility
Concentration sensor for precursor delivery system
7 Nov 23
A concentration sensor assembly can include a vaporization chamber having a compound.
Vivek B. Shah, Varoujan Chakarian, Upendra Ummethala
Filed: 1 Jul 21
Utility
Adding a floating analog voltage signal over a reference analog voltage signal
7 Nov 23
A method and a system for adding a floating analog voltage signal over a reference analog voltage signal.
Shem Yehoyda Prazot Ofenburg, Pavel Komissarov
Filed: 30 Mar 22
Utility
Reactor for Coating Particles In Stationary Chamber with Rotating Paddles
2 Nov 23
A reactor for coating particles includes a stationary vacuum chamber to hold a bed of particles to be coated, a vacuum port in an upper portion of the chamber, a chemical delivery system configured to inject a reactant or precursor gas into a lower portion of the chamber, a paddle assembly, and a motor to rotate a drive shaft of the paddle assembly.
Jonathan Frankel, Colin C. Neikirk, Pravin K. Narwankar, Quoc Truong, Govindraj Desai, Sekar Krishnasamy
Filed: 21 Jun 23
Utility
Photoluminescent Materials with Phosphorous Additives to Reduce Photodegradation
2 Nov 23
Multilayered semiconductor particles, which may be referred to as a quantum dots, may include a zinc-containing core.
Kulandaivelu Sivanandan, Sivapackia Ganapathiappan, Nag Patibandla
Filed: 1 May 23
Utility
Plating Systems Having Reduced Air Entrainment
2 Nov 23
Electroplating processing systems according to the present technology may include a recirculating tank containing a first volume of processing fluid.
Cameron Law, Daniel Durado, Thomas Oberlitner, Richard W. Plavidal
Filed: 6 Jul 23
Utility
Creating Ion Energy Distribution Functions (IEDF)
2 Nov 23
Systems and methods for creating arbitrarily-shaped ion energy distribution functions using shaped-pulse-bias.
Leonid DORF, Travis KOH, Olivier LUERE, Olivier JOUBERT, Philip A. KRAUS, Rajinder DHINDSA, James ROGERS
Filed: 11 Jul 23
Utility
Yttrium Oxide Based Coating and Bulk Compositions
2 Nov 23
Described herein is a plasma resistant protective coating composition and bulk composition that provides enhanced erosion and corrosion resistance upon the coating composition's or the bulk composition's exposure to harsh chemical environment (such as hydrogen based and/or halogen based chemistries) and/or upon the coating composition's or the bulk composition's exposure to high energy plasma.
Christopher Laurent Beaudry, Vahid Firouzdor, Joseph Frederick Sommers, Trevor Edward Wilantewicz, Hyun-Ho Doh, Joseph Frederick Behnke
Filed: 30 Jun 23
Utility
Systems and Methods for Analyzing Defects In CVD Films
2 Nov 23
Embodiments of the present technology may include semiconductor processing methods that include depositing a film of semiconductor material on a substrate in a substrate processing chamber.
Mandar B. Pandit, Man-Ping Cai, Wenhui Li, Michael Wenyoung Tsiang, Praket Prakash Jha, Jingmin Leng
Filed: 10 Jul 23
Utility
Multi-zone Lamp Heating for Chemical Vapor Deposition
2 Nov 23
Embodiments disclosed herein include a lamp module for a semiconductor processing chamber.
Tetsuya Ishikawa, Ala Moradian, Manjunath Subbanna, Kim Vellore, Matthew Miller, Michael Rice
Filed: 29 Apr 22