3198 patents
Page 20 of 160
Utility
Process kit with adjustable tuning ring for edge uniformity control
15 Aug 23
Process kits, processing chambers, and methods for processing a substrate are provided.
Yogananda Sarode Vishwanath
Filed: 25 Sep 20
Utility
Ultra-high modulus and etch selectivity boron-carbon hardmask films
15 Aug 23
Implementations of the present disclosure generally relate to the fabrication of integrated circuits.
Prashant Kumar Kulshreshtha, Ziqing Duan, Karthik Thimmavajjula Narasimha, Kwangduk Douglas Lee, Bok Hoen Kim
Filed: 1 Apr 21
Utility
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15 Aug 23
A system includes a substrate support on which to receive a transparent substrate, a non-contact sensor adapted to detect and image a dot pattern etched on a front surface of the transparent substrate, and a processing device attached to the non-contact sensor.
Michelle Alejandra Wong, Sanjay Rajaram
Filed: 5 May 20
Utility
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15 Aug 23
A method may include providing a device structure in the semiconductor device.
Sipeng Gu, Wei Zou
Filed: 7 Jun 21
Utility
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15 Aug 23
A P-type field effect transistor (PFET) device and a method for fabricating a PFET device using fully depleted silicon on insulator (FDSOI) technology is disclosed.
Sipeng Gu, Wei Zou, Kyu-Ha Shim, Qintao Zhang
Filed: 25 Sep 20
Utility
3u2p36c05x2m67r54tn83n2xglplz56m95zlg
15 Aug 23
Embodiments of the present disclosure relate to photovoltaic devices, CIGS containing films, and methods of manufacturing CIGS containing films and photovoltaic devices to improve quantum efficiency, reduce interface charges, electron losses, and electron re-combinations.
Philip Hsin-hua Li, Seshadri Ramaswami
Filed: 3 Dec 19
Utility
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8 Aug 23
A reactor for coating particles includes a stationary vacuum chamber to hold a bed of particles to be coated, a vacuum port in an upper portion of the chamber, a chemical delivery system configured to inject a reactant or precursor gas into a lower portion of the chamber, a paddle assembly, and a motor to rotate a drive shaft of the paddle assembly.
Jonathan Frankel, Colin C. Neikirk, Pravin K. Narwankar, Quoc Truong, Govindraj Desai, Sekar Krishnasamy
Filed: 22 Apr 20
Utility
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8 Aug 23
Embodiments of the present disclosure generally provide methods, polishing systems with computer readable medium having the methods stored thereon, to facilitate consistent tensioning of a polishing article disposed on a web-based polishing system.
Dmitry Sklyar, Jeonghoon Oh, Gerald J. Alonzo, Jonathan Domin, Steven M. Zuniga, Jay Gurusamy
Filed: 27 Aug 19
Utility
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8 Aug 23
A mask arrangement for masking a substrate in a processing chamber is provided.
Stefan Bangert, Tommaso Vercesi, Daniele Gislon, Oliver Heimel, Andreas Lopp, Dieter Haas
Filed: 26 Jun 19
Utility
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8 Aug 23
Methods and apparatus for controlling precursor flow are provided.
Sarah L. White, Elaina Noelle Babayan, Weize Hu
Filed: 17 Jul 20
Utility
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8 Aug 23
Pumping liners for process chambers including a first ring-shaped body and a second ring-shaped body are described.
Muhannad Mustafa, Muhammad M. Rasheed, Mario D. Sanchez
Filed: 26 Jul 22
Utility
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8 Aug 23
Implementations disclosed describe a collimator assembly having a collimator housing that includes an interface configured to optically couple to a process chamber that has a target surface, and a port to receive an optical fiber to deliver, to an enclosure formed by the collimator housing, a first (second) plurality of spectral components of light belonging to a first (second) range of wavelengths, and an achromatic lens located, at least partially, within the enclosure formed by the collimator housing, the achromatic lens to direct the first (second) plurality of spectral components of light onto the target surface to illuminate a first (second) region on the target surface, wherein the second region is substantially the same as the first region.
Pengyu Han, John Anthony O'Malley, Michael N. Grimbergen, Lei Lian, Upendra Ummethala, Michael Kutney
Filed: 11 Aug 20
Utility
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8 Aug 23
A multilayer stack in the form of a Bragg reflector comprising a graded interfacial layer and a method of manufacturing are disclosed.
Wen Xiao, Vibhu Jindal, Weimin Li, Shuwei Liu
Filed: 30 Mar 22
Utility
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8 Aug 23
Embodiments of the present disclosure generally relate to methods of forming a substrate having a target thickness distribution at one or more eyepiece areas across a substrate.
David Sell, Samarth Bhargava
Filed: 10 May 21
Utility
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8 Aug 23
Methods and apparatus for plasma processing substrate are provided herein.
Yue Guo, Kartik Ramaswamy, Yang Yang
Filed: 8 Nov 21
Utility
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8 Aug 23
Exemplary processing systems may include a processing chamber, and may include a remote plasma unit coupled with the processing chamber.
Ganesh Subbuswamy, Steven P. Warnert
Filed: 7 Jan 19
Utility
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8 Aug 23
Provided herein are approaches for controlling radicals in proximity to a wafer.
Christopher R. Hatem
Filed: 26 Feb 20
Utility
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8 Aug 23
Embodiments include methods and apparatuses that include a plasma processing tool that includes a plurality of magnets.
Philip Allan Kraus, Thai Cheng Chua, Mani Subramani
Filed: 3 Jun 21
Utility
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8 Aug 23
Methods for pre-cleaning substrates having metal and dielectric surfaces are described.
Yi Xu, Yufei Hu, Kazuya Daito, Yu Lei, Dien-Yeh Wu, Jallepally Ravi
Filed: 23 Nov 20
Utility
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8 Aug 23
Embodiments of the present disclosure generally relate to methods of depositing carbon film layers greater than 3,000 Å in thickness over a substrate and surface of a lid of a chamber using dual frequency, top, sidewall and bottom sources.
Anup Kumar Singh, Rick Kustra, Vinayak Vishwanath Hassan, Bhaskar Kumar, Krishna Nittala, Pramit Manna, Kaushik Comandoor Alayavalli, Ganesh Balasubramanian
Filed: 28 Sep 20